Prerequisites: ME 243 or equivalent; or consent of instructor
Description: Covers the fundamentals of gaseous plasmas and the physics of both equilibrium and non-equilibrium discharges. Covers the basic techniques for plasma diagnostics. Discusses the use of plasmas as a materials processing medium for a variety of manufacturing processes. Advanced topics such as the processing of nanostructured materials using plasmas are included.
Credit: Credit is awarded for only one of ME 274 or ME 274V.