Prerequisites: EE 201/ MSE 207, EE 202/MSE 217, EE 203/MSE 237C; or consent of instructor
Description: An in-depth study of nanoscale materials and device characterization techniques. Laboratory emphasizes atomic force microscopy (AFM) and scanning tunneling microscopy (STM). Topics include semiconductor fabrication fundamentals; metrology requirements; in situ monitoring; interconnects and failure analysis; principles of AFM, STM, BOETDBOOJOHFMFDUSPONJDSPTDPQZ9SBZNFUIPETPQUJDBM and infrared techniques; and electrical characterization.
Cross-listing: Cross-listed with EE 206.