Prerequisites: EE 201/MSE 207 or consent of instructor
Description: An in-depth study of nanoscale materials and device characteriza- tion techniques. Emphasizes atomic force microscopy (AFM) and scanning tunneling microscopy (STM). Includes semiconductor fabrication fundamentals; me- trology requirements; in situ monitoring; interconnects and failure analysis; principles of AFM, STM, and scanning electron microscopy; X-ray methods; optical and infrared techniques; and electrical characteriza- tion.
Cross-listing: Cross-listed with MSE 227.