EE 206: Nanoscale Characterization Techniques

2008-09 2009-10 →
changes (lax) changes (strict) ▾ 2010-11 → 2010-11 →

Units: 4

Hours: Lecture, 3 hours; laboratory, 3 hours

Catalog page 241

Prerequisites: EE 201, EE 202, EE 203; or consent of instructor

Description: An in-depth study of nanoscale materials and device characterization techniques. Laboratory emphasizes atomic force microscopy (AFM) and scanning tunnel- ing microscopy (STM). Topics include semiconductor fabrication fundamentals; metrology requirements; in situ monitoring; interconnects and failure analysis; principles of AFM, STM, and scanning electron microscopy; X-ray methods; optical and infrared tech- niques; and electrical characterization.

Derived Information — The following is not part of the official catalog but is computed from catalog data.
Prerequisite graph not available.
Enrollment History (from UCR Banner, not catalog)
Combined: EE 206 / MSE 227 / MSE 227A
Year F W S Su Total
2025-26 13/30 13/30
2024-25 13/30 13/30
2023-24 19/30 19/30
2022-23 10/30 10/30
2021-22 13/30 13/30
2020-21 22/30 22/30
2019-20 13/30 13/30
2018-19 21/30 21/30
2017-18 20/30 20/30
2016-17 27/30 27/30